The attempt to take IC lithography to the 157nm wavelength is forcing manufacturers to seek alternatives to a lens material that could send the price of steppers soaring even higher than today.

SANTA CLARA, Calif. — In a move to keep up with growing demand for its lithography-lens materials, Corning Inc. is aggressively ramping up production of these products in its new plant in Canton, N.Y.

Canon Inc. announced today the release of the FPA-3030i6 i-line[i] stepper, a new semiconductor lithography system for processing wafers with a diameter of 8 inches (200 mm) or smaller. The FPA-3030i6 ...

New data on the properties of potential "liquid lenses" compiled by the National Institute of Standards and Technology (NIST) could help the semiconductor industry continue to shrink feature sizes on ...

The rapid progress that is being made in lithography and many other areas of technology owes a lot to calcium fluoride crystals. Peter Maushake, product manager of German firm SCHOTT AG, looks at the ...

Exposure toolmaker Nikon said that it has shipped a production version of its immersion lithography scanner, the NSR-S609B. The tool shipped last month, and the Japanese supplier claimed it is the ...

Currently the most precise method for 3D printing complex microscopic features is two-photon lithography. The technique uses ...

Fig. 1 | Metalens-based DLW lithography. Schematic diagrams of (a) the DLW lithography setup, (b) the metalens and its constructing unit cells. (c) The metalens in top view and cross-section view. (d) ...

Designers of semiconductor lithography equipment have made some impressive strides over the last few years. But soon, they're going to be victims of their own success. Scientists at the National ...